Structural study of TiO2 thin films by m
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Niilisk, Ahti ;Moppel, Mart ;Pärs, Martti ;Sildos, Ilmo ;Jantson, Taavi ;Avarmaa
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Article
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2006
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Walter de Gruyter GmbH
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English
⚖ 269 KB
The Raman spectroscopy method was used for structural characterization of TiO 2 thin films prepared by atomic layer deposition (ALD) and pulsed laser deposition (PLD) on fused silica and single-crystal silicon and sapphire substrates. Using ALD, anatase thin films were grown on silica and silicon su