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Thin film deposition from beams of ionized atoms and clusters

✍ Scribed by A.E.T. Kuiper; G.E. Thomas; W.J. Schouten


Publisher
Elsevier Science
Year
1978
Tongue
English
Weight
121 KB
Volume
45
Category
Article
ISSN
0022-0248

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## Abstract Ruthenium thin films are deposited by atomic layer deposition (ALD) from bis(__N__,__N__'‐di‐__tert__‐butylacetamidinato)ruthenium(II) dicarbonyl and O~2~. Highly conductive, dense, and pure thin films can be deposited when oxygen exposure, __E__~O~, approaches a certain threshold (__E_