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Thickness measurement of titanium and titanium silicide films by infrared transmission

โœ Scribed by Lee, Jen-Jiang

Book ID
121775270
Publisher
AVS (American Vacuum Society)
Year
1988
Tongue
English
Weight
560 KB
Volume
6
Category
Article
ISSN
0734-211X

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Quantitative AES analysis of TiSi x (1.3 โ‰ค x โ‰ค 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de