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Thick-film lithography using laser write

✍ Scribed by Y. Cheng; T. Huang; C.-C. Chieng

Book ID
106184521
Publisher
Springer-Verlag
Year
2002
Tongue
English
Weight
207 KB
Volume
9
Category
Article
ISSN
0946-7076

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The Heidelberg Instruments Mikrotechnik (HIMT) DWL2.0 direct write laser lithography system is designed to provide cost-effective writing of submicron ASICs using a multi beam 442 nm HeCd laser with acousto-optical micro deflection. During the investigation of the machine performance at the Institut