Thermodynamic behaviour of GeO2 formed by oxygen implantation into relaxed Si0.5Ge0.5 alloy

✍ Scribed by J.P. Zhang; P.L.F. Hemment; J.E. Castle; H.D. Liu; J.F. Watts; R.A. Kubiak; S.M. Newstead; T.E. Whall; E.H.C. Parker

• Book ID: 113284929
• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 606 KB
• Volume: 96
• Category: Article
• ISSN: 0168-583X
• DOI: 10.1016/0168-583x(94)00500-1