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Thermalization of the flow of sputtered target atoms during ion-plasma deposition of films

โœ Scribed by Volpyas, Valery A.; Komlev, Andrey Y.; Platonov, Roman A.; Kozyrev, Andrey B.


Book ID
126552496
Publisher
Elsevier Science
Year
2014
Tongue
English
Weight
309 KB
Volume
378
Category
Article
ISSN
0375-9601

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Three-dimensional Monte Carlo simulation
โœ P.K. Petrov; V.A. Volpyas; R.A. Chakalov ๐Ÿ“‚ Article ๐Ÿ“… 1999 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 197 KB

An algorithm for Monte Carlo simulation of sputtered atom transport during ion-plasma sputtering was developed. The experimentally determined initial energy distribution of sputtered atoms, the influence of the background gas mixture and the real equipment geometry of the magnetron sputtering system