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Thermal stability of Ni(Pt) silicide films formed on poly-Si

✍ Scribed by I. Doi; R.C. Teixeira; R.E. Santos; J.A. Diniz; J.W. Swart; S.G. Santos Filho


Book ID
108207508
Publisher
Elsevier Science
Year
2005
Tongue
English
Weight
429 KB
Volume
82
Category
Article
ISSN
0167-9317

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NiPt (10% Pt) and Pt were investigated as alternatives to Ni for contact formation to SiGe (20%) source/drain. The germanosilicide phase formation and morphology were studied by means of sheet resistance measurements, X-ray diffraction (XRD) analysis and scanning electron microscopy (SEM) inspection