Improvement of thermal stability of Ni silicide on N+–Si by direct deposition of group III element (Al, B) thin film at Ni/Si interface

✍ Scribed by Kazuo Tsutsui; Takashi Shiozawa; Koji Nagahiro; Yoshihisa Ohishi; Kuniyuki Kakushima; Parhat Ahmet; Nobuyuki Urushihara; Mineharu Suzuki; Hiroshi Iwai

• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 479 KB
• Volume: 85
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2008.04.040