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Thermal process of iron silicides prepared by Magnetron sputtering

โœ Scribed by J. Zhang; Q. Xie; Y. Liang; W. Zeng; Q. Xiao; Q. Chen; D. Ma; Y. Wang; Koji Yamada; Jiaolian Luo


Publisher
Elsevier
Year
2011
Tongue
English
Weight
451 KB
Volume
11
Category
Article
ISSN
1875-3892

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of the title compound deposited on Si(110) substrates via reactive magnetron sputtering are investigated as a function of the deposition parameters in order to optimize the purity and structure. The analyses of the typical 200 nm thick films are carried out using ion-beam analysis as well as phase a