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Theoretical and experimental investigation of Si nanocrystal memory device with HfO2 high-k tunneling dielectric

✍ Scribed by Jong Jin Lee; Xuguang Wang; Weiping Bai; Nan Lu; Dim-Lee Kwong

Book ID: 114617202
Publisher: IEEE
Year: 2003
Tongue: English
Weight: 854 KB
Volume: 50
Category: Article
ISSN: 0018-9383
DOI: 10.1109/ted.2003.816107

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