✦ LIBER ✦

Theoretical analysis of silicon surface roughness induced by plasma etching

✍ Scribed by R. K. Tyagi

Book ID: 120896718
Publisher: Allerton Press, Inc.
Year: 2013
Tongue: English
Weight: 169 KB
Volume: 49
Category: Article
ISSN: 1068-3755
DOI: 10.3103/S1068375513010158

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Surface roughness generated by plasma et

Surface roughness generated by plasma etching processes of silicon

✍ Martin, M. ;Cunge, G. 📂 Article 📅 2008 🏛 AVS (American Vacuum Society) 🌐 English ⚖ 736 KB

Mechanisms of surface roughness induced

Mechanisms of surface roughness induced in silicon by fluorine containing plasmas

✍ Ronaldo D Mansano; Patrick Verdonck; Homero S Maciel 📂 Article 📅 1997 🏛 Elsevier Science 🌐 English ⚖ 321 KB

## Deep trenches were etched in silicon with SF, plasmas in a simple RIE system. Two process factors influence directly the silicon surface roughness generated by these processes: the dc bias voltage and the presence of oxygen. In general, the roughness increases when the dc bias voltage becomes mor

Evolution of surface roughness of AlN an

Evolution of surface roughness of AlN and GaN induced by inductively coupled Cl2/Ar plasma etching

✍ Zhu, K.; Kuryatkov, V.; Borisov, B.; Yun, J.; Kipshidze, G.; Nikishin, S. A.; Te 📂 Article 📅 2004 🏛 American Institute of Physics 🌐 English ⚖ 793 KB

Stochastic features of rough surfaces: a

Stochastic features of rough surfaces: analysis of laser-induced silicon surface modification

✍ Vahabi, M; Jafari, G R; Mansour, N; Karimzadeh, R; Zamiranvari, J 📂 Article 📅 2008 🏛 Institute of Physics 🌐 English ⚖ 815 KB

An ATR analysis of surface roughness ind

An ATR analysis of surface roughness induced by electron bombardment

✍ A. Humbert; J. Hanus 📂 Article 📅 1983 🏛 Elsevier Science 🌐 English ⚖ 842 KB

Silicon trench undercutting caused by th

Silicon trench undercutting caused by the preferential plasma etching of surface-implanted-regions

✍ Shenai, K. 📂 Article 📅 1992 🏛 IEEE 🌐 English ⚖ 259 KB