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Surface roughness generated by plasma etching processes of silicon

✍ Scribed by Martin, M. ;Cunge, G.

Book ID: 121797214
Publisher: AVS (American Vacuum Society)
Year: 2008
Tongue: English
Weight: 736 KB
Volume: 26
Category: Article
ISSN: 0734-211X
DOI: 10.1116/1.2932091

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