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Low-Roughness Plasma Etching of HgCdTe Masked with Patterned Silicon Dioxide

✍ Scribed by Z. H. Ye; W. D. Hu; W. T. Yin; J. Huang; C. Lin; X. N. Hu; R. J. Ding; X. S. Chen; W. Lu; L. He

Book ID: 107457287
Publisher: Springer US
Year: 2011
Tongue: English
Weight: 377 KB
Volume: 40
Category: Article
ISSN: 0361-5235
DOI: 10.1007/s11664-011-1633-x

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