Simulation of silicon dry etching through a mask in low pressure fluorine-based plasma

✍ Scribed by R Knizikevičius; A Galdikas; A Grigonis; L Pranevičius; Ž Rutkūnienë

• Book ID: 108390310
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 581 KB
• Volume: 47
• Category: Article
• ISSN: 0042-207X
• DOI: 10.1016/s0042-207x(96)00223-0