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Simultaneous In situ Measurement of Silicon Substrate Temperature and Silicon Dioxide Film Thickness during Plasma Etching of Silicon Dioxide Using Low-Coherence Interferometry

✍ Scribed by Koshimizu, Chishio; Ohta, Takayuki; Matsudo, Tatsuo; Tsuchitani, Shigeki; Ito, Masafumi

Book ID: 120472484
Publisher: Institute of Pure and Applied Physics
Year: 2012
Tongue: English
Weight: 816 KB
Volume: 51
Category: Article
ISSN: 0021-4922
DOI: 10.1143/JJAP.51.046201

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