✦ LIBER ✦
ChemInform Abstract: Low Temperature Plasmaless Etching of Silicon Dioxide Film Using Chlorine Trifluoride Gas with Water Vapor.
✍ Scribed by Makoto Saito; Yoshinori Kataoka; Tetsuya Homma; Takao Nagatomo
- Publisher
- John Wiley and Sons
- Year
- 2001
- Weight
- 33 KB
- Volume
- 32
- Category
- Article
- ISSN
- 0931-7597
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