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Surface modification in plasma-assisted etching of silicon

✍ Scribed by T. Mizutani; C.J. Dale; W.K. Chu; T.M. Mayer

Book ID: 113277188
Publisher: Elsevier Science
Year: 1985
Tongue: English
Weight: 653 KB
Volume: 7-8
Category: Article
ISSN: 0168-583X
DOI: 10.1016/0168-583x(85)90477-x

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## Abstract The morphology of metal‐assisted electroless etched n‐type silicon in HF–oxidizing agent–H~2~O etching system as a function of oxidizing type and etching time was studied. Three types of oxidizing agent were investigated: Na~2~S~2~O~8~, K~2~Cr~2~O~7~ and KMnO~4~. The layers formed on si