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The thermal decomposition of surface oxides formed on Graphon

โœ Scribed by Roger Phillips; F.J. Vastola; P.L. Walker Jr.


Publisher
Elsevier Science
Year
1970
Tongue
English
Weight
565 KB
Volume
8
Category
Article
ISSN
0008-6223

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โœฆ Synopsis


The thermal decomposition of surface oxides formed during the low pressure oxidation of Graphon was studied. Oxidation reactions were performed at 525", 575" and 625ยฐC in a static reactor, using initial 0, pressures between 10 and 200 mtorr. The amount of surface oxide formed was found to increase with decreasing reaction temperature and increasing initial 0, pressure. The surface oxides were decomposed by raising the temperature at 3ยฐC per min up to 950ยฐC in a closed system and measuring the partial pressures of the CO and COz produced at frequent intervals. Each graph of accumulated CO against temperature consisted of a series of intersecting linear portions, suggesting that desorption was taking place from a number of discrete types of sites. The accumulated CO, measured was found to pass through a maximum at about 7OO"C, after which the partial pressure decreased due to the reaction of CO, with the Graphon surface. The rate of this secondary reaction was found to be strongly dependent on the rate of decomposition of the surface oxide, and it is suggested that decomposition of surface oxide leaves highly reactive 'nascent' sites on the Graphon surface at which CO, can react.


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