The traditional approach to magnetron sputter deposition is to describe the plasma, the sputtering and bombardment processes, atom transport and film deposition individually as separate non-interacting processes. In reality, however, strong interactions exist between most of these phenomena. As an e
The role of plasmatron/magnetron systems in physical vapor deposition techniques
โ Scribed by S. Schiller; U. Heisig; K. Goedicke
- Publisher
- Elsevier Science
- Year
- 1978
- Tongue
- English
- Weight
- 900 KB
- Volume
- 54
- Category
- Article
- ISSN
- 0040-6090
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