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The preferred orientation of silicon films grown by Lpcvd at relatively low temperatures

✍ Scribed by Th. Karakostas; D. Meakin; P. Migliorato; J. Stoemenos; N. A. Economou

Book ID: 105292023
Publisher: Springer
Year: 1988
Tongue: English
Weight: 888 KB
Volume: 7
Category: Article
ISSN: 0261-8028
DOI: 10.1007/bf01730186

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