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The modeling of ion implantation in a three-layer structure using the method of dose matching

✍ Scribed by Amaratunga, G.A.J.; Sabine, K.; Evans, A.G.R.

Book ID: 114595280
Publisher: IEEE
Year: 1985
Tongue: English
Weight: 263 KB
Volume: 32
Category: Article
ISSN: 0018-9383
DOI: 10.1109/t-ed.1985.22215

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