The interface between silicon and a high
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Först, Clemens J.; Ashman, Christopher R.; Schwarz, Karlheinz; Blöchl, Peter E.
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Article
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2004
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Nature Publishing Group
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English
⚖ 240 KB
The ability of the semiconductor industry to continue scaling microelectronic devices to ever smaller dimensions (a trend known as Moore's Law) is limited by quantum mechanical effects: as the thickness of conventional silicon dioxide (SiO(2)) gate insulators is reduced to just a few atomic layers,