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The interface anisotropy of FeTi multilayers prepared by dual-facing-target sputtering

✍ Scribed by M.S. Liu; E.Y. Jiang; Z.J. Wang; X.X. Zhang; Y.G. Liu

Book ID
113318882
Publisher
Elsevier Science
Year
1995
Tongue
English
Weight
217 KB
Volume
140-144
Category
Article
ISSN
0304-8853

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The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a