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The structures and magnetic properties of FeN films prepared by the facing targets sputtering method

✍ Scribed by Jiang, En-yong; Sun, Chang-qing; Li, Jin-e; Liu, Yu-guang


Book ID
120734291
Publisher
American Institute of Physics
Year
1989
Tongue
English
Weight
733 KB
Volume
65
Category
Article
ISSN
0021-8979

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The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a