## Abstract Layerโtype van der Waals semiconductor WS~2โ__x__~ films were grown by radio frequency reactive magnetron sputtering from a metallic tungsten target onto oxidized silicon substrates. The sputtering atmosphere consisted of 75% hydrogen sulfide and 25% neon, argon or xenon. The substrate
The influence of the target age on laterally resolved ion distributions in reactive planar magnetron sputtering
โ Scribed by Thomas Welzel; Klaus Ellmer
- Book ID
- 113919385
- Publisher
- Elsevier Science
- Year
- 2011
- Tongue
- English
- Weight
- 985 KB
- Volume
- 205
- Category
- Article
- ISSN
- 0257-8972
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๐ SIMILAR VOLUMES
## Abstract Tungsten disulfide WS~2~ is a layerโtype semiโconductor with an energy band gap and an absorption coefficient making it suitable as an absorber for thin film solar cells. In the article [1] WS~2โ__x__~ films were preโpared by reactive magnetron sputtering from a metallic tungsten target
The effects of argon pressure and the solute element on compositional changes have been studied in binary Co-early transition metal (ETM) thin films fabricated by r.f. magnetron sputtering using the composite target mode. The solute concentration of the deposited film increases linearly with the are