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The influence of the microstructure evolution on the surface morphology in the annealing process of helium-implanted spinel

✍ Scribed by Yitao Yang; Chonghong Zhang; Lihong Zhou; Bingsheng Li

Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
484 KB
Volume
266
Category
Article
ISSN
0168-583X

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The microstructure evolution of a hydrogen-implanted Si(111) wafer during annealing was studied using transmission electron microscopy (TEM). In the damaged layer caused by hydrogen implantation before annealing, most defects are platelet-like and are located on (111) planes. A few amorphous clumps