✦ LIBER ✦

The influence of the Coulomb interaction effect in the electron beam on the developed resist structure for the projection lithography

✍ Scribed by M. Kotera; M. Sakai; K. Yamada; K. Tamura; Y. Tomo; I. Simizu; A. Yoshida; Y. Kojima; M. Yamabe

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

The stitching error dependence of the re

✍ Yanqiu Li; Atsushi Yamada 📂 Article 📅 2004 🏛 Elsevier Science 🌐 English ⚖ 862 KB

Characteristics of the resist developmen

✍ N.A. Madjarova 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 364 KB

Electron beam lithography — influence of

✍ Sharma, Varinder K. ;Affrossman, Stanley ;Pethrick, Richard A. 📂 Article 📅 1984 🏛 Wiley (John Wiley & Sons) 🌐 English ⚖ 393 KB

Effect of intersite coulomb interaction

✍ V. V. Val’kov; M. M. Korovushkin 📂 Article 📅 2007 🏛 Allerton Press Inc 🌐 English ⚖ 138 KB

Effect of resist development process on

✍ S.V. Babin; A.A. Svintsov 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 286 KB

Influence of electron coulomb interactio

✍ C. Gorse; M. Dilonardo; M. Capitelli; J. Wilhelm; R. Winkler 📂 Article 📅 1984 🏛 Italian Physical Society 🌐 English ⚖ 376 KB