The stitching error dependence of the resist pattern accuracy for electron beam projection lithography

✍ Scribed by Yanqiu Li; Atsushi Yamada

• Publisher: Elsevier Science
• Year: 2004
• Tongue: English
• Weight: 862 KB
• Volume: 71
• Category: Article
• ISSN: 0167-9317
• DOI: 10.1016/j.mee.2003.09.008