๐”– Bobbio Scriptorium
โœฆ   LIBER   โœฆ

Systematic considerations for the patterning of photonic crystal devices by electron beam lithography

โœ Scribed by Hejun Yu; Jinzhong Yu; Fei Sun; Zhiyong Li; Shaowu Chen

Publisher
Elsevier Science
Year
2007
Tongue
English
Weight
352 KB
Volume
271
Category
Article
ISSN
0030-4018

No coin nor oath required. For personal study only.

๐Ÿ“œ SIMILAR VOLUMES

Direct Sub-Micrometer-Patterning of Conj
Direct Sub-Micrometer-Patterning of Conjugated Polymers and Polymer Light-Emitting Devices by Electron Beam Lithography
โœ Evelin Fisslthaler; Meltem Sezen; Harald Plank; Alexander Blรผmel; Stefan Sax; We ๐Ÿ“‚ Article ๐Ÿ“… 2010 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 446 KB

## Abstract The lateral pattering of polymer light emitting devices (PLEDs) on the microโ€ and even subโ€micrometer level is a challenging task. Being able to fabricate devices with subโ€micrometer active device dimensions will, however, open new possibilities for fundamental studies as well as enable