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The influence of an epitaxial CoSi2 layer on diffusion of B and Sb in underlying Si during oxidation

✍ Scribed by A. K. Tyagi; U. Breuer; H. Holzbrecher; J. S. Becker; H.-J. Dietze; L. Kappius; H. L. Bay; S. Mantl

No coin nor oath required. For personal study only.

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