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The influence of oxide/nitride surface layers on diffusion in Si and SiGe

✍ Scribed by N.R. Zangenberg; J. Chevallier; J.L. Hansen; A Nylandsted Larsen

Publisher: Springer
Year: 2005
Tongue: English
Weight: 663 KB
Volume: 81
Category: Article
ISSN: 1432-0630
DOI: 10.1007/s00339-004-2958-6

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