An isotopic labeling study of the diffusion mechanism during oxidation of Si(100) in water vapor by successive oxidation

✍ Scribed by C. Zhong; Y. M. Jiang; J. Gong; B. Deng; J. Li

• Publisher: Springer
• Year: 2009
• Tongue: English
• Weight: 523 KB
• Volume: 97
• Category: Article
• ISSN: 1432-0630
• DOI: 10.1007/s00339-009-5286-z