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The incorporation of hydrogen into III-V nitrides during processing

โœ Scribed by S. J. Pearton; R. J. Shul; R. G. Wilson; F. Ren; J. M. Zavada; C. R. Abernathy; C. B. Vartuli; J. W. Lee; J. R. Mileham; J. D. Mackenzie

Book ID
112820286
Publisher
Springer US
Year
1996
Tongue
English
Weight
628 KB
Volume
25
Category
Article
ISSN
0361-5235

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We report the results of examination of incorporation of chlorine and fluorine into silica as revealed from secondary ion mass spectroscopy (SIMS) and Raman spectroscopy measurements. The samples were preform-like rods made by the MCVD process. SIMS spectra were used for quantitative analysis of C1