Comparative study of incorporation of Cl and F into SiO2 during the MCVD process

✍ Scribed by A. Chmel; V.N. Svetlov

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 308 KB
• Volume: 4
• Category: Article
• ISSN: 0925-3467
• DOI: 10.1016/0925-3467(95)00037-2

✦ Synopsis

We report the results of examination of incorporation of chlorine and fluorine into silica as revealed from secondary ion mass spectroscopy (SIMS) and Raman spectroscopy measurements. The samples were preform-like rods made by the MCVD process. SIMS spectra were used for quantitative analysis of C1 concentration in glass. The concentrations of F were obtained from the Raman spectra. Both spectroscopic methods indicated the presence of Si-CI groups in SiO2 synthesized from chlorine-rich vapour gaseous blend. The difference in structural roles of C1 and F in chemically deposited silica manifests itself in the efficiency of their bonding to Si and in interaction with intrinsic structural defects.