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About the fluorine chemistry in MCVD: The mechanism of fluorine incorporation into SiO2 layers

โœ Scribed by Dr. J. Kirchhof; Dr. S. Unger; Dr. B. Knappe; Dr. sc. P. Kleinert; A. Funke


Publisher
John Wiley and Sons
Year
1987
Tongue
English
Weight
407 KB
Volume
22
Category
Article
ISSN
0232-1300

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