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About the Fluorine Chemistry in MCVD: The Influence of Fluorine Doping on SiO2 Deposition

✍ Scribed by Dr. Johannes Kirchhof; Dr. sc. nat. Peter Kleinert; Dr. Sonja Unger; A. Funke

Publisher: John Wiley and Sons
Year: 1986
Tongue: English
Weight: 431 KB
Volume: 21
Category: Article
ISSN: 0232-1300
DOI: 10.1002/crat.2170211113

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