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The hot refractory anode vacuum arc: a new plasma source for metallic film deposition

โœ Scribed by I.I Beilis; S Goldsmith; R.L Boxman

Book ID
108422788
Publisher
Elsevier Science
Year
2000
Tongue
English
Weight
561 KB
Volume
133-134
Category
Article
ISSN
0257-8972

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๐Ÿ“œ SIMILAR VOLUMES

Metallic film deposition using a vacuum
Metallic film deposition using a vacuum arc plasma source with a refractory anode
โœ Isak I. Beilis; Raymond L. Boxman ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 994 KB

Conventional metallic film deposition techniques are compared with the hot refractory anode vacuum arc (HRAVA) developed in the last decade. In the HRAVA process, the anode is heated by the arc, and a dense plasma plume of cathode material is formed by re-evaporation of cathode material from the ano

Chromium and titanium film deposition us
Chromium and titanium film deposition using a hot refractory anode vacuum arc plasma source
โœ I.I. Beilis; A. Shnaiderman; R.L. Boxman ๐Ÿ“‚ Article ๐Ÿ“… 2008 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 480 KB

The radially expanding plasma jet generated in a Hot Refractory Anode Vacuum Arc (HRAVA) was used to deposit thin chromium and titanium films on glass substrates. The arc was sustained between a water-cooled cylindrical cathode and a non-consumed cylindrical tungsten anode separated by a 10 mm gap,