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A new kind of cathodic arc plasma PVD system with column target for the deposition of TiN film and other metallic films

✍ Scribed by Liu Weiyi; Li Yumin; Cui Zhanjun; He Tianxi


Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
123 KB
Volume
42
Category
Article
ISSN
0042-207X

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