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Thin film deposition using a plasma source with a hot refractory anode vacuum arc

✍ Scribed by Isak I. Beilis; Yosef Koulik; Raymond L. Boxman; David Arbilly

Publisher: Springer
Year: 2010
Tongue: English
Weight: 900 KB
Volume: 45
Category: Article
ISSN: 0022-2461
DOI: 10.1007/s10853-010-4452-1

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