The Effects of Ion Sputtering on Dentin and its Relation to Depth Profiling
β Scribed by Miller, R.G. ;Bowles, C.Q. ;Gutshall, P.L. ;Eick, J.D.
- Book ID
- 121877307
- Publisher
- International and American Association of Dental Research
- Year
- 1994
- Tongue
- English
- Weight
- 573 KB
- Volume
- 73
- Category
- Article
- ISSN
- 0022-0345
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## Abstract To study the factors limiting the depth resolution of sputter depth profiling, we have examined the influence of ion mixing, ion beamβinduced roughness and temperature on the interface resolution of metallic bilayers consisting of Pt on top of Ni or Ti. We studied Pt/Ni and Pt/Ti interf
Sputtering-induced surface roughness is the main source of degradation of the depth resolution observed during depth proΓling of polycrystalline metals. Atomic force microscopy (AFM) images of polycrystalline Al Γlms at di β erent mean sputtered depths are used to calculate both the depth distributio