✦ LIBER ✦

The effect of the polishing pad treatments on the chemical-mechanical polishing of SiO2 films

✍ Scribed by Weidan Li; Dong Wook Shin; Minoru Tomozawa; Shyam P. Murarka

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 648 KB
Volume: 270
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(96)80082-4

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Chemical-mechanical polishing of SiO2 th

Chemical-mechanical polishing of SiO2 thin films studied by X-ray reflectivity

✍ W.E. Wallace; W.L. Wu; R.A. Carpio 📂 Article 📅 1996 🏛 Elsevier Science 🌐 English ⚖ 693 KB

On the mechanism of chemical polishing o

On the mechanism of chemical polishing of GaAs crystals

✍ D. Zach; Dr. habil. H. Löwe 📂 Article 📅 1983 🏛 John Wiley and Sons 🌐 English ⚖ 283 KB 👁 2 views

## On the Mechanism of Chemical Polishing of GaAs Crystals In order to establish reproducible conditions for chemical lap polishing of GaAs with NaOCl solutions, containing also OH-and CO:--ions, the mechanism of dissolution was investigated using the rotating disk arrangement. I n solutions with

The effect of oxygen on polishing of ste

The effect of oxygen on polishing of steel

✍ G.V. Vinogradov; E.G. Berdichevsky 📂 Article 📅 1967 🏛 Elsevier Science 🌐 English ⚖ 518 KB

Study on the polishing of chemically vap

Study on the polishing of chemically vapour deposited diamond film

✍ Hitoshi Tokura; Cheng-Feng Yang; Masanori Yoshikawa 📂 Article 📅 1992 🏛 Elsevier Science 🌐 English ⚖ 648 KB

On the mechanism of polishing with abras

On the mechanism of polishing with abrasives

✍ E. Rabinowicz 📂 Article 📅 1971 🏛 Elsevier Science 🌐 English ⚖ 158 KB

On the Polishing Effect of Nanosecond Di

On the Polishing Effect of Nanosecond Discharges in Vacuum

✍ B. Jüttner 📂 Article 📅 1979 🏛 John Wiley and Sons 🌐 English ⚖ 413 KB