On the mechanism of chemical polishing o
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D. Zach; Dr. habil. H. LΓΆwe
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Article
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1983
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John Wiley and Sons
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English
β 283 KB
π 2 views
## On the Mechanism of Chemical Polishing of GaAs Crystals In order to establish reproducible conditions for chemical lap polishing of GaAs with NaOCl solutions, containing also OH-and CO:--ions, the mechanism of dissolution was investigated using the rotating disk arrangement. I n solutions with