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Chemical-mechanical polishing of SiO2 thin films studied by X-ray reflectivity

✍ Scribed by W.E. Wallace; W.L. Wu; R.A. Carpio

Publisher: Elsevier Science
Year: 1996
Tongue: English
Weight: 693 KB
Volume: 280
Category: Article
ISSN: 0040-6090
DOI: 10.1016/0040-6090(95)08178-x

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