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The effect of substrate temperature on the properties of sputtered titanium oxide films

โœ Scribed by Li-jian Meng; M. Andritschky; M.P. dos Santos

Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
347 KB
Volume
65-66
Category
Article
ISSN
0169-4332

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dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent