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Effect of substrate bias and temperature on magnetron sputtered CrSiN films

✍ Scribed by Shuyong Tan; Xuhai Zhang; Xiangjun Wu; Feng Fang; Jianqing Jiang

Publisher
Elsevier Science
Year
2011
Tongue
English
Weight
777 KB
Volume
257
Category
Article
ISSN
0169-4332

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Effect of substrate temperature on the structural, optical and electrical properties of dc magnetron sputtered tantalum oxide films
✍ S.V. Jagadeesh Chandra; S. Uthanna; G. Mohan Rao πŸ“‚ Article πŸ“… 2008 πŸ› Elsevier Science 🌐 English βš– 669 KB

dc reactive magnetron sputtering technique was employed for deposition of tantalum oxide films on quartz and silicon substrates by sputtering of pure tantalum target in the presence of oxygen and argon gases under various substrate temperatures in the range 303-973 K. The variation of cathode potent