Tin oxide thin films were grown by atmospheric pressure chemical vapor deposition (APCVD) on glass substrates at temperatures of 400, 500 and 600 1C with various deposition times from 15 to 60 min with 15 min time intervals. A homemade horizontal reactor was used for deposition from SnCl 2 þ 2H 2 O
✦ LIBER ✦
The effect of substrate temperature on the microstructural properties of nanocrystalline tin oxide coatings produced by APCVD
✍ Scribed by R. Karslıoğlu; A. Alp; H. Akbulut
- Publisher
- Springer US
- Year
- 2009
- Tongue
- English
- Weight
- 918 KB
- Volume
- 7
- Category
- Article
- ISSN
- 1935-3804
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