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Substrate Effects on the Micro/Nanomechanical Properties of TiN Coatings

✍ Scribed by T.H. Zhang; Y. Huan

Publisher
Springer US
Year
2004
Tongue
English
Weight
336 KB
Volume
17
Category
Article
ISSN
1023-8883

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Tin oxide thin films were grown by atmospheric pressure chemical vapor deposition (APCVD) on glass substrates at temperatures of 400, 500 and 600 1C with various deposition times from 15 to 60 min with 15 min time intervals. A homemade horizontal reactor was used for deposition from SnCl 2 ΓΎ 2H 2 O