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Influence of low temperature nitridization on the microstructure, morphology and optical properties of tin oxide nanocrystallines

✍ Scribed by C.X. Hu; Y.S. Wu; N. Lun; Y.C. Shi; H.Y. Wei; L.L. Wu

Publisher
Elsevier Science
Year
2004
Tongue
English
Weight
237 KB
Volume
110
Category
Article
ISSN
0921-5107

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Tin oxide thin films were grown by atmospheric pressure chemical vapor deposition (APCVD) on glass substrates at temperatures of 400, 500 and 600 1C with various deposition times from 15 to 60 min with 15 min time intervals. A homemade horizontal reactor was used for deposition from SnCl 2 ΓΎ 2H 2 O