The Effect of Process Parameters on 4H-SiC Single Crystal Grown by a PVT Method
β Scribed by Yeo, Im Gyu; Lee, Tae Woo; Park, Jong Hwi; Yang, Woo Sung; Ryu, Heui Bum; Park, Mi Seon; Kim, Il Soo; Shin, Byoung Chul; Lee, Won Jae; Eun, Tai Hee; Lee, Seung Seok; Chun, Myong Chuel
- Book ID
- 121184297
- Publisher
- Trans Tech Publications, Ltd.
- Year
- 2011
- Tongue
- English
- Weight
- 407 KB
- Volume
- 679-680
- Category
- Article
- ISSN
- 1662-9752
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π SIMILAR VOLUMES
## Abstract Misoriented domains (MDs) are common defects in 6HβSiC single crystals. We performed an experimental study on the formation of MDs in 2βinch 6HβSiC single crystals. MicroβRaman spectroscopy revealed that the polytype of MDs was mainly 4HβSiC. By changing growth conditions, it was found
A transmission electron microscopy (TEM) study on the generation of stacking faults (SFs) and stacking fault (SF) induced inclusion during 3C-SiC growth by Continuous Feed Physical Vapour Transport (CF-PVT) method on 4H-SiC substrates is presented. A transition region of about 100 nm between the 4H-