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The effect of argon pressure on the structural and photocatalytic characteristics of TiO2 thin films deposited by d.c. magnetron sputtering

✍ Scribed by K. Eufinger; E.N. Janssen; H. Poelman; D. Poelman; R. De Gryse; G.B. Marin

No coin nor oath required. For personal study only.

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